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An '''RF antenna ion source''' or ] antenna ion source is an internal multicusp design which can produce a ] of about ~30 to 40 mA beam current. It is used in high energy ]. The ion source section is located in the front end of the machine. An '''RF antenna ion source''' or ] antenna ion source is an internal multicusp design which can produce a ] of about ~30 to 40 mA beam current. It is used in high energy ]. The ion source section is located in the front end of the machine.

Revision as of 00:00, 20 November 2005

An RF antenna ion source or radio frequency antenna ion source is an internal multicusp design which can produce a particle beam of about ~30 to 40 mA beam current. It is used in high energy particle physics. The ion source section is located in the front end of the machine.

Original antennas developed penetrations in the porcelin enamel coating on the antenna section at high RF power. This problem has been corrected in the development stage with a ten layer coating TiO2 ~ 1mm thick coating.

With the development of the RF antenna ion source or non-thermionic ion source, this type of ion source has an advantage over conventional cold cathodes, and certainly hot filament ion sources. Where the filament constantly burns out over time and has a shorter lifetime span requiring venting the ion source to atmosphere, rebuilding the ion source, the RF antenna ion source supersedes conventional ion sources.

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