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| '''Hexafluoroacetylacetone''' is the ] with the ] CF<sub>3</sub>C(O)CH<sub>2</sub>C(O)CF<sub>3</sub>. This colourless liquid is a ] precursor and a reagent used in ]. Complexes of the conjugate base, often called Hfac<sup>-</sup>, exhibit enhanced volatility and ]ity relative to analogous complexes derived from ]. | '''Hexafluoroacetylacetone''' is the ] with the ] CF<sub>3</sub>C(O)CH<sub>2</sub>C(O)CF<sub>3</sub> (often abbreviated as hfac). This colourless liquid is a ] precursor and a reagent used in ]. Complexes of the conjugate base, often called Hfac<sup>-</sup>, exhibit enhanced volatility and ]ity relative to analogous complexes derived from ]. | ||
| This ] compound was first prepared by the ] of ] ] of ] and 1,1,1-trifluoroacetone.<ref>{{cite journal | author = Henne, Albert L.; Newman, Melvin S.; Quill, Laurence L.; Staniforth, Robert A. | title = Alkaline condensation of fluorinated esters with esters and ketones | year = 1947 | journal = ] | volume = 69 | issue = | pages = 1819–20 | doi =10.1021/ja01199a075 }}</ref> It has been investigated as an etchant for copper and its complexes, such as Cu(Hfac)(trimethylvinylsilane) have been employed as precursors in ].<ref>{{cite journal | author = Mark J. Hampden-Smith, Toivo T. Kodas | title = Chemical vapour deposition of copper from (hfac)CuL compounds | year = 1995 | journal = ] | volume = 14 | issue = | pages = 699–732 | doi = 10.1016/0277-5387(94)00401-Y}}</ref> | This ] compound was first prepared by the ] of ] ] of ] and 1,1,1-trifluoroacetone.<ref>{{cite journal | author = Henne, Albert L.; Newman, Melvin S.; Quill, Laurence L.; Staniforth, Robert A. | title = Alkaline condensation of fluorinated esters with esters and ketones | year = 1947 | journal = ] | volume = 69 | issue = | pages = 1819–20 | doi =10.1021/ja01199a075 }}</ref> It has been investigated as an etchant for copper and its complexes, such as Cu(Hfac)(trimethylvinylsilane) have been employed as precursors in ].<ref>{{cite journal | author = Mark J. Hampden-Smith, Toivo T. Kodas | title = Chemical vapour deposition of copper from (hfac)CuL compounds | year = 1995 | journal = ] | volume = 14 | issue = | pages = 699–732 | doi = 10.1016/0277-5387(94)00401-Y}}</ref> | ||
Revision as of 19:03, 12 October 2011
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| Names | |
|---|---|
| IUPAC name 1,1,1,5,5,5-Hexafluoro-2,4-pentanedione | |
| Other names Hexafluoroacetylacetone, HfacH | |
| Identifiers | |
| CAS Number | |
| 3D model (JSmol) | |
| ChemSpider | |
| ECHA InfoCard | 100.014.719 
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| PubChem CID | |
| CompTox Dashboard (EPA) | |
InChI
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SMILES
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| Properties | |
| Chemical formula | C5H2F6O2 |
| Molar mass | 208.06 g/mol |
| Appearance | colourless liquid |
| Density | 1.47 g/mL |
| Boiling point | 70-71 °C |
| Solubility in water | organic solvents |
| Hazards | |
| Occupational safety and health (OHS/OSH): | |
| Main hazards | toxic |
Except where otherwise noted, data are given for materials in their standard state (at 25 °C , 100 kPa).
 Y verify (what is ?)
Infobox references
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Hexafluoroacetylacetone is the chemical compound with the formula CF3C(O)CH2C(O)CF3 (often abbreviated as hfac). This colourless liquid is a ligand precursor and a reagent used in MOCVD. Complexes of the conjugate base, often called Hfac, exhibit enhanced volatility and Lewis acidity relative to analogous complexes derived from acetylacetone.
This organofluorine compound was first prepared by the condensation of ethyl ester of trifluoroacetic acid and 1,1,1-trifluoroacetone. It has been investigated as an etchant for copper and its complexes, such as Cu(Hfac)(trimethylvinylsilane) have been employed as precursors in microelectronics.
References
- Henne, Albert L.; Newman, Melvin S.; Quill, Laurence L.; Staniforth, Robert A. (1947). "Alkaline condensation of fluorinated esters with esters and ketones". Journal of the American Chemical Society. 69: 1819–20. doi:10.1021/ja01199a075.
{{cite journal}}: CS1 maint: multiple names: authors list (link) - Mark J. Hampden-Smith, Toivo T. Kodas (1995). "Chemical vapour deposition of copper from (hfac)CuL compounds". Polyhedron. 14: 699–732. doi:10.1016/0277-5387(94)00401-Y.