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{{Chembox |
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{{Chembox |
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| Watchedfields = changed |
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| Verifiedfields = changed |
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| verifiedrevid = 269521517 |
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| verifiedrevid = 476995335 |
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| PIN = Silicon monoxide |
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| PIN = Silicon monoxide |
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| ImageFile = Silicon monoxide.jpg |
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| SystematicName = oxidanylsilanylidyne |
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|ImageFile2=Silicon-monoxide-3D-balls.png |
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| OtherNames = Oxosilylene |
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| Section1 = {{Chembox Identifiers |
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|Section1={{Chembox Identifiers |
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| InChI1 = 1/OSi/c1-2 |
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| InChI = 1/OSi/c1-2 |
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| InChIKey1 = LIVNPJMFVYWSIS-UHFFFAOYAO |
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| InChIKey = LIVNPJMFVYWSIS-UHFFFAOYAO |
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| InChI1 = 1S/OSi/c1-2 |
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| InChIKey1 = LIVNPJMFVYWSIS-UHFFFAOYSA-N |
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| CASNo = 10097-28-6 |
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| CASNo = 10097-28-6 |
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| CASNo_Ref = {{cascite|correct|CAS}} |
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| CASNo_Ref = {{cascite|correct|CAS}} |
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| UNII_Ref = {{fdacite|correct|FDA}} |
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| PubChem = 66241 |
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| UNII = 1OQN9CBG7L |
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| PubChem_Ref = {{Pubchemcite | correct | PubChem}} |
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| ChemSpiderID = 59626 |
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| PubChem = 66241 |
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| ChemSpiderID = 59626 |
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| ChemSpiderID_Ref = {{Chemspidercite | correct | ChemSpider}} |
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| ChemSpiderID_Ref = {{chemspidercite|correct|chemspider}} |
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| EINECS = 233-232-8 |
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| MeSHName = Silicon+monoxide |
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| EINECS = 233-232-8 |
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| MeSHName = Silicon+monoxide |
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| ChEBI_Ref = {{ebicite|correct|EBI}} |
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| ChEBI = 30588 |
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| SMILES = # |
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| ChEBI = 30588 |
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| InChI = 1S/H3OSi/c1-2/h2H3 |
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| SMILES = # |
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| StdInChI_Ref = {{stdinchicite|changed|chemspider}} |
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| InChIKey = UXMAWJKSGBRJKV-UHFFFAOYSA-N |
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| StdInChI = 1S/H3OSi/c1-2/h2H3 |
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| Gmelin = 382}} |
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| StdInChIKey_Ref = {{stdinchicite|changed|chemspider}} |
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| Section2 = {{Chembox Properties |
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| StdInChIKey = UXMAWJKSGBRJKV-UHFFFAOYSA-N |
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| Formula = SiO |
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| Gmelin = 382 |
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| MolarMass = 44.0849 g/mol |
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| Appearance = brown-black glassy solid |
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| Density = 2.13 g/cm<sup>3</sup> |
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| MeltingPt = 1702 °C |
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| BoilingPt = 1880 °C |
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| Solubility = insoluble |
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}} |
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}} |
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| Section7 = {{Chembox Hazards |
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|Section2={{Chembox Properties |
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| ExternalMSDS = |
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| Formula = SiO |
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| EUIndex = Not listed |
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| MolarMass = 44.08 g/mol |
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| Appearance = brown-black glassy solid |
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| EUClass = |
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| Density = 2.13 g/cm<sup>3</sup> |
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| RPhrases = |
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| SPhrases = |
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| MeltingPtC = 1702 |
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| BoilingPtC = 1880 |
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| MainHazards = |
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| NFPA-H = 1 |
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| Solubility = insoluble |
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| NFPA-F = 0 |
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| NFPA-R = 0 |
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| NFPA-O = |
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| FlashPt = Non-flammable |
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}} |
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}} |
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| Section8 = {{Chembox Related |
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|Section7={{Chembox Hazards |
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| ExternalSDS = |
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| OtherAnions = ]<br/>]<br/>] |
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| HPhrases = |
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| OtherCations = ]<br/>]<br/>]<br/>] |
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| PPhrases = |
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| OtherFunctn = ] |
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| GHS_ref = |
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| Function = ] ]s |
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| OtherCpds = |
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| MainHazards = |
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| NFPA-H = 1 |
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| NFPA-F = 0 |
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| NFPA-R = 0 |
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| NFPA-S = |
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| FlashPt = Non-flammable |
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}} |
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|Section8={{Chembox Related |
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| OtherAnions = ]<br />]<br />] |
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| OtherCations = ]<br />]<br />]<br />] |
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| OtherFunction = ] |
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| OtherFunction_label = ] ]s |
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| OtherCompounds = |
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'''Silicon monoxide''' is the chemical compound with the formula SiO. In the vapour phase it is a diatomic molecule.<ref name = "Wiberg&Holleman">{{Holleman&Wiberg}}</ref> It has been detected in stellar objects (e.g.<ref>A survey of SiO 5 -> 4 emission towards outflows from massive young stellar objects, Gibb, A. G.; Davis, C. J.; Moore, T. J. T., Monthly Notices of the Royal Astronomical Society, 382, 3, 1213-1224,{{doi|10.1111/j.1365-2966.2007.12455.x}}, {{arXiv|0709.3088v1}}</ref>) and it has been described as the most common oxide of silicon in the universe.<ref name = "Jutzi">Peter Jutzi, Ulrich Schubert, (2003), ''Silicon chemistry: from the atom to extended systems'', Wiley-VCH ISBN 3527306471</ref><br /> |
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When SiO gas is cooled rapidly it condenses to form a glassy brown/black amorphous solid which is available commercially and used to deposit films of SiO, which oxidize in air giving SiO<sub>2</sub>.<ref name = "Wiberg&Holleman"/> |
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'''Silicon monoxide''' is the chemical compound with the formula SiO where silicon is present in the oxidation state +2. In the vapour phase, it is a diatomic molecule.<ref name="Wiberg&Holleman">{{Holleman&Wiberg}}</ref> |
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==Molecular SiO== |
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It has been detected in stellar objects<ref>Gibb, A.G.; Davis, C.J.; Moore, T.J.T., A survey of SiO 5 → 4 emission towards outflows from massive young stellar objects. ], 382, 3, 1213-1224. {{doi|10.1111/j.1365-2966.2007.12455.x}}, {{arXiv|0709.3088v1}}.</ref> and has been described as the most common ] of silicon in the universe.<ref name="Jutzi">Peter Jutzi and Ulrich Schubert (2003) ''Silicon chemistry: from the atom to extended systems''. Wiley-VCH {{ISBN|3-527-30647-1}}.</ref> |
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When SiO<sub>2</sub> is heated with silicon, gaseous SiO is produced<ref name = "Wiberg&Holleman"/>: |
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:SiO<sub>2</sub> + Si → 2SiO |
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] can be removed from ores or minerals by heating with silicon to produce gaseous SiO.<ref name = "Wiberg&Holleman"/> |
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==Solid form== |
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Refractories containing SiO<sub>2</sub> can be corroded by reduction with H<sub>2</sub> or CO at high temperatures e.g.:<ref>Charles A. Schacht Refractories handbook (2004), CRC Press, ISBN 0824756541</ref> |
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When SiO gas is cooled rapidly, it condenses to form a brown/black polymeric ]y material, (SiO)<sub>''n''</sub>, which is available commercially and used to deposit films of SiO. Glassy (SiO)<sub>''n''</sub> is air and moisture sensitive.{{clarify|date=January 2021}}{{citation needed|date=January 2021}} |
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==Oxidation== |
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:SiO<sub>2</sub> + H<sub>2</sub> → SiO + H<sub>2</sub>O |
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Its surface readily oxidizes in air at ], giving an SiO<sub>2</sub> surface layer that ]. However, (SiO)<sub>''n''</sub> irreversibly ] into SiO<sub>2</sub> and Si in a few hours between 400 °C and 800 °C and very rapidly between 1,000 °C and 1,440 °C, although the reaction does not go to completion.<ref>{{cite journal | last1=HERTL | first1=W. | last2=PULTZ | first2=W. W. | title=Disproportionation and Vaporization of Solid Silicon Monoxide | journal=Journal of the American Ceramic Society | publisher=Wiley | volume=50 | issue=7 | year=1967 | issn=0002-7820 | doi=10.1111/j.1151-2916.1967.tb15135.x | pages=378–381}}</ref> |
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==Production== |
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SiO decomposes rapidly:<ref name = "Wiberg&Holleman"/> |
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The first precise report on the formation of SiO was in 1887<ref name="Vol VI 1947 p. 235">J. W. Mellor "A Comprehensive Treatise on Inorganic and Theoretical Chemistry" Vol VI, Longmans, Green and Co. (1947) p. 235.</ref> by the chemist ] (1850–1927) at the ] in ]. Maybery claimed that SiO formed as an amorphous greenish-yellow substance with a vitreous luster when silica was reduced with charcoal in the absence of metals in an electric furnace.<ref>C. F. Maybery ''Amer. Chem. Journ.'' 9, 11, (1887).</ref> The substance was always found at the interface between the charcoal and silica particles. |
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:2SiO → SiO<sub>2</sub> + Si |
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By investigating some of the chemical properties of the substance, its specific gravity, and a combustion analysis, Maybery deduced that the substance must be SiO. The equation representing the partial chemical reduction of SiO<sub>2</sub> with C can be represented as: |
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===Matrix isolated SiO=== |
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Silicon monoxide has been trapped in an argon matrix cooled by helium and the Si-O bond length determined from molecules trapped in argon matrix is 148.9 pm.<ref name = "Jutzi"/> The bond length is similar to that in linear, molecular, SiO<sub>2</sub> and there is no indication of a triple bond as in ].<ref name = "Jutzi"/><br /> |
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SiO dimers, trimers and tetramers have been detected that all have (Si-O)<sub>n</sub> ring structures and contain no Si-Si bonds.<ref name = "Jutzi"/> |
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:{{chem|SiO|2}} + {{chem|C}} ⇌ {{chem|SiO + CO}} |
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SiO condensed with ], ] or COS, followed by irradiation with light, the planar molecules OSiF<sub>2</sub>,(Si-O 148 pm); OSiCl<sub>2</sub>, (Si-O 149 pm) and linear OSiS (Si-O 149 pm, Si-S 190 pm) are produced.<ref name = "Jutzi"/> |
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Complete reduction of SiO<sub>2</sub> with twice the amount of carbon yields elemental silicon and twice the amount of carbon monoxide. In 1890, the German chemist ] (the discoverer of germanium) was the first to attempt to synthesize SiO by heating silicon dioxide with silicon in a combustion furnace.<ref>C. Winkler ''Ber''. 23, (1890) p. 2652.</ref> |
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SiO condensed with oxygen atoms generated by microwave discharge produces molecular SiO<sub>2</sub> which has a linear structure.<br /> |
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When metal atoms are codeposited (i.e. Na, Al, Pd, Ag, Au) triatomic molecules are produced with linear, (AlSiO and PdSiO), non-linear (AgSiO and AuSiO), and ring (NaSiO) structures.<ref name = "Jutzi"/> |
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:{{chem|SiO|2}} + {{chem|Si}} ⇌ {{chem|2 SiO}} |
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==Solid SiO== |
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Recent work suggests that the commercially available solid form is best considered as an inhomogenous mixture of ] and ] with evidence of bonding at the interface of the Si and SiO<sub>2</sub> phases.<ref>Some comments on so-called silicon monoxide, Friede B., Jansen M., Journal of Non-Crystalline solids , 204, 2, (1996), 202-203, {{doi|10.1016/S0022-3093(96)00555-8}}</ref><ref>TEM investigation on the structure of amorphous silicon monoxide, Schulmeister K. and Mader W., Journal of Non-Crystalline Solids, 320, 1-3, (2003), 143-150, {{doi|10.1016/S0022-3093(03)00029-2}}</ref> |
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However, Winkler was not able to produce the monoxide since the temperature of the mixture was only around 1000 °C. The experiment was repeated in 1905 by ] (1869–1942), a ] engineer. Using an electric furnace, Potter was able to attain a temperature of 1700 °C and observe the generation of SiO.<ref name="Vol VI 1947 p. 235"/> Potter also investigated the properties and applications of the solid form of SiO.<ref>U.S. Patent 182,082, July 26, 1905.</ref><ref>E. F. Roeber H. C. Parmelee (Eds.) (1907) p. 442.</ref> |
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=== Gaseous form === |
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Because of the volatility of SiO, silica can be removed from ores or minerals by heating them with silicon to produce gaseous SiO in this manner.<ref name="Wiberg&Holleman" /> However, due to the difficulties associated with accurately measuring its vapor pressure, and because of the dependency on the specifics of the experimental design, various values have been reported in the literature for the vapor pressure of SiO (g). For the p<sub>SiO</sub> above molten silicon in a quartz (SiO<sub>2</sub>) crucible at the melting point of silicon, one study yielded a value of 0.002 atm.<ref>"Handbook of Semiconductor Silicon Technology," W. C. O'Mara, R. B. Herring, L. P. Hunt, Noyes Publications (1990), p. 148</ref> For the direct vaporization of pure, amorphous SiO solid, 0.001 atm has been reported.<ref>{{cite journal | last1=Nuth III | first1=Joseph A. | last2=Ferguson | first2=Frank T. | title=Silicates Do Nucleate in Oxygen-rich Circumstellar Outflows: New Vapor Pressure Data for SiO | journal=The Astrophysical Journal | publisher=American Astronomical Society | volume=649 | issue=2 | year=2006 | issn=0004-637X | doi=10.1086/506264 | pages=1178–1183| bibcode=2006ApJ...649.1178N | s2cid=123656840 | doi-access=free }}</ref> For a coating system, at the phase boundary between SiO<sub>2</sub> and a silicide, 0.01 atm was reported.<ref>"High-Temperature Oxidation-Resistant Coatings ," National Academy of Sciences/National Academy of Engineering (1970), p. 40</ref> |
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Silica itself, or refractories containing SiO<sub>2</sub>, can be reduced with H<sub>2</sub> or CO at high temperatures, e.g.:<ref>Charles A. (2004) Schacht Refractories handbook. CRC Press, {{ISBN|0-8247-5654-1}}.</ref> |
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:{{chem|SiO|2|(s) + H|2|}}(g) ⇌ {{chem| SiO(g) + H|2|O(g)}} |
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As the SiO product volatilizes off (is removed), the equilibrium shifts to the right, resulting in the continued consumption of SiO<sub>2</sub>. Based on the dependence of the rate of silica weight loss on the gas flow rate normal to the interface, the rate of this reduction appears to be controlled by convective diffusion or mass transfer from the reacting surface.<ref>{{cite journal | last1=Han | first1=Gilsoo | last2=Sohn | first2=Hong Yong | title=Kinetics of the Hydrogen Reduction of Silica Incorporating the Effect of Gas-Volume Change upon Reaction | journal=Journal of the American Ceramic Society | publisher=Wiley | volume=88 | issue=4 | year=2005 | issn=0002-7820 | doi=10.1111/j.1551-2916.2005.00144.x | pages=882–888}}</ref><ref>{{cite journal | last=Gardner | first=Richard A. | title=The kinetics of silica reduction in hydrogen | journal=Journal of Solid State Chemistry | publisher=Elsevier BV | volume=9 | issue=4 | year=1974 | issn=0022-4596 | doi=10.1016/0022-4596(74)90092-9 | pages=336–344| bibcode=1974JSSCh...9..336G }}</ref> |
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==Gaseous (molecular) form== |
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Silicon monoxide molecules have been trapped in an argon matrix cooled by helium. In these conditions, the SiO bond length is between 148.9 pm<ref name="Jutzi" /> and 151 pm.<ref name="Inorganic Chemistry 2001 p. 858">Inorganic Chemistry, Holleman-Wiberg, Academic Press (2001) p. 858.</ref> This bond length is similar to the length of Si=O double bonds (148 pm) in the matrix-isolated linear molecule {{chem|SiO|2}} (O=Si=O), suggestive of the absence of a triple bond as in ].<ref name="Jutzi" /> However, the SiO triple bond has a calculated bond length of 150 pm and a bond energy of 794 kJ/mol, which are also very close to those reported for SiO.<ref name="Inorganic Chemistry 2001 p. 858"/> In the carbon analogues the formal double bonds of ] (116 pm) is also close to the triple bond length of ] (112.8 pm); in light of this the observed bond length of SiO may be consistent with at least some triple-bond character in the diatomic molecule. The SiO double bond structure is, notably, an exception to Lewis' ] for molecules composed of the light main group elements, whereas the SiO triple bond satisfies this rule. That anomaly not withstanding, the observation that monomeric SiO is short-lived and that (SiO)<sub>'n'</sub> ]s with 'n' = 2,3,4,5 are known,<ref>{{Cite journal|last1=Chrystie|first1=Robin S. M.|last2=Janbazi|first2=Hossein|last3=Dreier|first3=Thomas|last4=Wiggers|first4=Hartmut|last5=Wlokas|first5=Irenäus|last6=Schulz|first6=Christof|date=2019-01-01|title=Comparative study of flame-based SiO2 nanoparticle synthesis from TMS and HMDSO: SiO-LIF concentration measurement and detailed simulation|journal=Proceedings of the Combustion Institute|volume=37|issue=1|pages=1221–1229|doi=10.1016/j.proci.2018.07.024|s2cid=139291303 |issn=1540-7489}}</ref> all having closed ring structures in which the silicon atoms are connected through bridging oxygen atoms (i.e. each oxygen atom is singly bonded to two silicon atoms; no Si-Si bonds), suggests the Si=O double bond structure, with a hypovalent silicon atom, is likely for the monomer.<ref name="Jutzi" /> |
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Condensing molecular SiO in argon matrix together with ], ] or ] (COS), followed by irradiation with light, produces the planar molecules {{chem|OSiF|2}} (with Si-O distance 148 pm) and {{chem|OSiCl|2}} (Si-O 149 pm), and the linear molecule {{chem|OSiS}} (Si-O 149 pm, Si-S 190 pm).<ref name="Jutzi" /> |
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Matrix-isolated molecular SiO reacts with oxygen atoms generated by microwave discharge to produce molecular {{chem|SiO|2}} which has a linear structure. |
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When metal atoms (such as ], ], ], ], and ]) are co-deposited with SiO, triatomic molecules are produced with linear (AlSiO and PdSiO), non-linear (AgSiO and AuSiO), and ring (NaSiO) structures.<ref name="Jutzi" /> |
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==Solid (polymeric) form== |
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Potter reported SiO solid as yellowish-brown in color and as being an electrical and thermal insulator. The solid burns in oxygen and decomposes water with the liberation of hydrogen. It dissolves in warm alkali hydroxides and in hydrofluoric acid. Even though Potter reported the heat of combustion of SiO to be 200 to 800 calories higher than that of an equilibrium mixture of Si and SiO<sub>2</sub> (which could, arguably, be used as evidence that SiO is a unique chemical compound),<ref>J. W. Mellor "A Comprehensive Treatise on Inorganic and Theoretical Chemistry" Vol VI, Longmans, Green and Co. (1947) p. 234.</ref> some studies characterized commercially available solid silicon monoxide materials as an inhomogeneous mixture of amorphous ] and amorphous ] with some chemical bonding at the interface of the Si and SiO<sub>2</sub> phases.<ref>Friede B., Jansen M. (1996) Some comments on so-called silicon monoxide. Journal of Non-Crystalline Solids, 204, 2, 202-203. {{doi|10.1016/S0022-3093(96)00555-8}}.</ref><ref>Schulmeister K. and Mader W. (2003) TEM investigation on the structure of amorphous silicon monoxide. Journal of Non-Crystalline Solids, 320, 1-3, 143-150. {{doi|10.1016/S0022-3093(03)00029-2}}.</ref> Recent spectroscopic studies in a correlation with Potter's report suggest that commercially available solid silicon monoxide materials can not be considered as an inhomogeneous mixture of amorphous ] and amorphous ].<ref>Gunduz, D. C., Tankut, A., Sedani, S., Karaman, M. and Turan, R. (2015) Crystallization and phase separation mechanism of silicon oxide thin films fabricated via e-beam evaporation of silicon monoxide. Phys. Status Solidi C, 12: 1229–1235. {{doi|10.1002/pssc.201510114}}. |
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</ref> |
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== Interstellar occurrence == |
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Interstellar SiO was first reported in 1971 after detection in the giant molecular cloud ].<ref>{{Cite journal|last1=Wilson|first1=R. W.|last2=Penzias|first2=A. A.|last3=Jefferts|first3=K. B.|last4=Kutner|first4=M.|last5=Thaddeus|first5=P.|date=1971|title=Discovery of Interstellar Silicon Monoxide|journal=The Astrophysical Journal|language=en|volume=167|pages=L97|doi=10.1086/180769|bibcode=1971ApJ...167L..97W|issn=0004-637X|doi-access=free}}</ref> SiO is used as a molecular tracer of shocked gas in ] outflows.<ref>{{Cite journal|last1=Martin-Pintado|first1=J.|last2=Bachiller|first2=R.|last3=Fuente|first3=A.|date=1992-02-01|title=SIO Emission as a Tracer of Shocked Gas in Molecular Outflows|url=http://adsabs.harvard.edu/abs/1992A%26A...254..315M|journal=Astronomy and Astrophysics|volume=254|pages=315|bibcode=1992A&A...254..315M|issn=0004-6361}}</ref> |
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==References== |
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==References== |
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{{reflist}} |
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{{Reflist}} |
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{{Molecules detected in outer space}} |
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{{silicon compounds}} |
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{{Oxides}} |
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{{Authority control}} |
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